- deposition current
- <el.chem> (of stripping voltammetry) ■ Anreicherungsstrom m
English-german technical dictionary. 2013.
English-german technical dictionary. 2013.
Current crowding — (also current crowding effect, or CCE) is a nonhomogenous distribution of current density through a conductor or semiconductor, especially at the vicinity of the contacts and over the PN junctions. Current crowding is one of the limiting factors… … Wikipedia
Deposition (chemistry) — In chemistry, deposition is the settling of particles (atoms or molecules) or sediment from a solution, suspension and mixture or vapor onto a pre existing surface. Deposition generally results in growth of new phase and is of fundamental… … Wikipedia
Deposition (geology) — Map of Cape Cod showing shores undergoing erosion (cliffed sections) in red, and shores characterized by marine deposition (barriers) in blue[1] Deposition is the geological proc … Wikipedia
Current sea level rise — This article is about the current and future rise in sea level associated with global warming. For sea level changes in Earth s history, see Sea level#Changes through geologic time. Sea level measurements from 23 long tide gauge records in… … Wikipedia
Current integrator — A current integrator is an electronic device performing a time integration of an electric current, thus measuring a total electric charge.One application of current integration is in ion beam deposition, where the measured charge directly… … Wikipedia
Electrophoretic deposition — (EPD), is a term for a broad range of industrial processes which includes electrocoating, cathodic electrodeposition, and electrophoretic coating, or electrophoretic painting. A characteristic feature of this process is that colloidal particles… … Wikipedia
Plasma-enhanced chemical vapor deposition — PECVD machine at LAAS technological facility in Toulouse, France. Plasma enhanced chemical vapor deposition (PECVD) is a process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved… … Wikipedia
Cathodic arc deposition — or Arc PVD is a physical vapor deposition technique in which an electric arc is used to vaporize material from a cathode target. The vaporized material then condenses on a substrate, forming a thin film. The technique is can be used to deposit a… … Wikipedia
Sputter deposition — is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting, material from a target, that is source, which then deposits onto a substrate, such as a silicon wafer. Resputtering is re emission of the… … Wikipedia
Thin-film deposition — is any technique for depositing a thin film of material onto a substrate or onto previously deposited layers. Thin is a relative term, but most deposition techniques allow layer thickness to be controlled within a few tens of nanometers, and some … Wikipedia
Electron beam physical vapor deposition — or EBPVD is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electron beam causes atoms from the target to transform into the gaseous… … Wikipedia